Partners: University of Oulu

  • Expertise & Current Research Activities

  • Facilities

  • Participant

  • Development of metal oxide materials, e.g. VO2, V2O5, WO3, SnO2 in the form of nanoparticles, thin films, and metamaterials structures
  • Utilization of phase transitions of metal oxide materials, e.g. VO2, V2O5, WO3, in gas sensors
  • Development of an integrated nanoparticle detector based on, for example, piezoelectric actuation, impedance measurements, etc.

  • Pulsed Laser Deposition (PLD) of complex metal oxides
  • Ink jet printing of nanoparticle and carbon nanotube inks
  • Clean room class 100–1000 for semiconductor processing
  • Focused Ion Beam (FIB) facility for nanostructure fabrication
  • XRD and XPS facilities for materials structural characterization
  • Electron microscopy FESEM), energy filtered transmission electron microscopy EFTEM)
  • Scanning Probe Microscopy SPM) facility with piezoforce microscopy, conductivity–AFM, Kelvin–probe, etc. nanocharacterization options
  • Gas sensor response characterization facility with gas mixing systems for O2, NH3, CO, NO, NO2, etc. at RT– 600°C

foto

LAPPALAINEN Jyrki
Lab.: Microelectronics and Materials Physics Laboratories
Org.: University of Oulu
Country: Finland
Tel. +358 294 482720 - Fax +358 8 5532728
e-Mail jyla@ee.oulu.fi
Web http://www.ee.oulu.fi/research/miklab/



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